New Dual-type Electron Cyclotron Resonance Ion Source for a Universal Source of Synthesized Ion Beams*

A new dual-type source has been constructing on the basis of electron cyclotron resonance (ECR) plasma for producing synthesized ion beams in Osaka Univ. Magnetic field in the 1st stage consists of all permanent magnets, i.e., cylindrically comb shaped one, and that of the 2nd stage consists of a pair of mirror coil, a supplemental coil and the octupole magnets. Both stage plasmas can be individually operated, and produced ions which energy controlled by large bore extractor also can be transported from the 1st to the 2nd stage. Fundamental operations and effects of this source, and analysis of ion beams and investigation of plasma parameters are conducted on produced plasmas in dual plasmas operation as well as each single operation.